SEMICONDUCTOR

SEMICONDUCTOR

On-Site Hydrogen for Semiconductor Fabrication

Semiconductor fabs require continuous supplies of ultra-pure hydrogen for thermal annealing, chemical vapor deposition, and reducing atmospheres. On-site electrolysis with IONZERA membranes eliminates cylinder dependency.

Membrane Cross-Section

PSU-TiO₂-GO
OH⁻OH⁻OH⁻PSU MatrixTiO₂GO SheetsPores350-410 μm

Eliminate Cylinder Logistics

On-site generation replaces the complex logistics of compressed hydrogen cylinder delivery, storage, and changeover in cleanroom-adjacent areas.

Consistent Supply Reliability

Alkaline electrolysers with IONZERA membranes provide continuous, demand-responsive hydrogen generation, ensuring fab operations never face supply interruptions.

Lower Operating Cost

IONZERA's 3x lower area resistance reduces the electricity cost of on-site H2 generation versus both delivered cylinders and less efficient electrolyser alternatives.

Compact Installation

IONZERA's thin 350-410 um profile enables compact electrolyser stacks that fit within the space constraints of semiconductor facility utility areas.

Hydrogen in Semiconductor Manufacturing

The semiconductor industry uses hydrogen in multiple critical process steps. Forming gas (H2/N2 mixtures) is used in thermal annealing to passivate silicon-silicon dioxide interfaces. Pure hydrogen serves as a carrier gas in chemical vapor deposition (CVD) and epitaxial growth processes. Reducing atmospheres containing hydrogen prevent oxidation during high-temperature processing steps.

While individual fab hydrogen consumption is modest compared to industrial-scale applications, the requirements for purity, reliability, and continuous availability are exceptionally stringent. On-site electrolysis using IONZERA membranes addresses all of these requirements while eliminating the logistical complexity of delivered gas.

Advantages of On-Site Electrolytic H2

Compared to cylinder or tube trailer delivery, on-site electrolysis offers several advantages for semiconductor fabs:

Continuous generation matched to real-time demand, eliminating the risk of supply gaps during delivery delays
Reduced safety risks from compressed hydrogen storage and handling in proximity to cleanroom environments
Lower total cost of ownership versus premium-priced delivered ultra-high-purity hydrogen
Electrolytic hydrogen is inherently free of carbon-containing impurities that can contaminate semiconductor processes

Nanocomposite Structure

PSU-TiO₂-GO
OH⁻OH⁻OH⁻PSU MatrixTiO₂GO SheetsPores350-410 μm
3x

Lower Resistance

20%

Thinner Profile

Integration with Fab Utility Systems

G-Hexa works with semiconductor facility equipment suppliers to provide IONZERA membranes optimized for the compact, reliable electrolysers that fab utility systems demand. Our engineering team can support sizing calculations based on your fab's hydrogen consumption profile and purity requirements, including post-electrolysis purification specifications.

Area Resistance

3x LOWER
Area Specific Resistance ComparisonIONZERA0.09-0.1 Ω·cm²Zirfon0.30 Ω·cm²00.10.20.3 Ω·cm²~3x Lower

Thickness

20% THINNER
Membrane Thickness ComparisonIONZERA350-410 μmZirfon500 μm500 μm scale20-30%thinnerThinner membrane = More compact stacks= Higher power density
Ready to Start

Ready to Evaluate IONZERA?

Request a sample to test IONZERA in your application. Our engineering team will support you through qualification and integration.

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